Workshop - Layout of Microstructures
10. 2. 2021
Pavel Neužil (CEITEC BUT and Department of Microsystem Engineering, NPU, Xi‘an, China)
This workshop will introduce a modern tool to design the layout of chips, the Nanolithography Toolbox, a platform-independent software package for scripted lithography pattern layout generation developed by the Center for Nanoscale Science and Technology (CNST) at the National Institute of Standards and Technology (NIST). It is based on an extensive library of parameterized shapes as building blocks. This software allows users to rapidly design and layout nanoscale devices of arbitrary complexity through scripting and programming. The Toolbox offers many parameterized shapes, including structure libraries for micro- and nanoelectromechanical systems (MEMS and NEMS) and nanophotonic devices. Furthermore, the Toolbox allows users to precisely define the number of vertices for each shape or create vectorized shapes using Bezier curves. Parameterized control allows users to design smooth curves with complex shapes. The Toolbox is applicable to a broad range of design tasks in the fabrication of microscale and nanoscale devices.